Fraunhofer Institute for Integrated Systems and Device Technology
Fraunhofer Institute for Integrated Systems and Device Technology

CoLiSA.MMP Publications

Pubications from the project will be listed here once they have been published. You are kindly invited to revisit this page to check for updates.

Below you will find also selected publications describing background work by the project partners.

Newsrooms and Others

  1. Ulrich Welling, Weihua Li and Marcus Müller: "Computing how copolymers form nanoscale structures", SPIE Newsroom

Journal and Proceeding Articles

  1. Tim Fühner, Ulrich Welling, Marcus Müller, Andreas Erdmann: "Rigorous simulation and optimization of the lithography/directed self-assembly co-process", Proc. SPIE 9051 (2014) 90521C.
  2. Weihua H. Li, Paul F. Nealey, Juan J. de Pablo, Marcus Müller: "Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition", Phys. Rev. Letters 113 (2014) 168301.
  3. Marcus Müller, Weihua H. Li, Juan C. Orozco Rey, Ulrich Welling: “Kinetics of directed self-assembly of block copolymers on chemically patterned substrates”, J. Phys.: Conf. Ser. (CCP2014), 640 (2015) 012010.
  4. Marcus Müller, Weihua H. Li, Juan C. Orozco Rey, and Ulrich Welling: “Defect annihilation in chemo-epitaxial directed assembly: Computer simulation and self-consistent field theory”, MRS Fall Meeting proceedings 175 (2014) mrsf14-1750-kk03-05.
  5. Su-Mi Hur, Gurdaman S. Khaira, Abelardo Ramírez-Hernández, Marcus Müller, Paul F. Nealey, Juan J. de Pablo: "Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing", ACS Macro Lett. 4 (2015) 11-15.
  6. Laura Evangelio, Marta Fernández-Regúlez, Xavier Borrisé, Matteo Lorenzoni, Jordi Fraxedas, Francesc Pérez-Murano: “Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure”, Proc. SPIE 9423 (2015) 942326.
  7. Guillaume Fleury, Karim Aissou, Muhammed Mumtaza, Xavier Chevalier, Célia Nicolet, Christophe Navarro, Marta Fernandez-Regulez, Patricia Pimenta-Barros, Raluca Tiron, Cyril Brochon, Eric Cloutet, Georges Hadziioannou, “Development and Integration of systems with enhanced resolutions based on Si-containing block copolymers for line space applications”, Proc. SPIE 9425 (2015) 94250Z.
  8. Yecheol Rho, Karim Aissou, Muhammad Mumtaz, Wonsang Kwon, Gilles Pécastaings, Cristian Mocuta, Stefan Stanecu, Eric Cloutet, Cyril Brochon, Guillaume Fleury, Georges Hadziioannou. “Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films“, Small, 11 (2015), 6377-6383.
  9. Weihua H. Li and Marcus Müller: “Defects in the self-assembly of block copolymers and their relevance for directed self-assembly”, Annual Rev. Chem. Biomol. Eng., 6 (2015), 187-216.
  10. Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Xavier Chevalier, Patricia Pimenta Barros, Célia Nicolet, Christophe Navarro: “Contact holes patterning by directed self-assembly of block copolymers: process window study”, J. Micro/Nanolith. MEMS MOEMS 14(2), 023508, (2015)
  11. Tim Fühner, Przemysław Michalak, Ulrich Welling, Juan Carlos Orozco-Rey, Marcus Müller, and Andreas Erdmann: “An integrated source/mask/DSA optimization approach”, Proc. SPIE 9780 (2016) 7800M.
  12. Weihua Li and Marcus Müller: “Thermodynamics and kinetics of defect motion and annihilation in the self-assembly of lamellar diblock copolymers“, Macromolecules, 49 (2016), 6126-6138
  13. Weihua Li and Marcus Müller: “Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics“, Prog. Polym. Sci., 54-55 (2016), 47-75
  14. Su-Mi Hur, Vikram Thapar, Abelardo Ramirez-Hernandez, Gurdama Khaira, Tamar Segal-Peretz, Paulina A. Rincon-Delgadillo, Weihua Li, Marcus Müller, Paul F. Nealey, and Juan J. de Pablo, “Pathways to Perfection in Directed Block Copolymer Self-Assembly“ PNAS, 112 (2015), 14144-14149
  15. Guillaume Claveau, Patrick Quemere, Maxime Argoud, Jerome Hazart, Patricia Pimenta Barros, Aurelien Sarrazin, Nicolas Posseme, Raluca Tiron, Xavier Chevalier, Célia Nicolet, Christophe Navarro: “Surface affinity role in graphoepitaxy of lamellar block copolymers”, J. Micro/Nanolith. MEMS MOEMS 15(3), 031604 (2016)
  16. Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Gaëlle Chamiot-Maitral, Antoine Fouquet, Céline Lapeyre, Patricia Pimenta Barros, Florian Delachat, Sandra Bos, Shayma Bouanani, Xavier Chevalier, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Laurent Pain: “Process highlights to enhance directed self-assembly contact patterning performances”, J. Micro/Nanolith. MEMS MOEMS 15(4), 043503 (2016)
  17. Ulrich Welling and Marcus Müller, “Ordering block copolymers with structured electrodes“, Soft Matter, in press doi 10.1039/c6sm01911k.

Talks and posters at Conferences, Symposia and Workshops

  1. Tim Fühner, Ulrich Welling, Marcus Müller and Andreas Erdmann: "Rigorous simulation and optimization of the lithography/directed self-assembly co-process", talk at SPIE Advanced Lithography, San Jose (USA), February 2014.
  2. Marcus Müller: "Directing the assembly of block copolymers by controling the kinetics," talk at Telluride Science Research Center, Telluride (CO, USA), February 2014.
  3. Marcus Müller, Dewen Sun, and Ulrich Welling: "Directing the self-assembly of block copolymers: A Single-Chain-in-Mean-Field simulation study," talk at NIC Symposium, Jülich (Germany), February 2014.
  4. Marcus Müller and Dewen Sun: "Directing the self-assembly of copolymers into a metastable complex network phase via a deep and rapid quench", talk at APS Denver (CO, USA), March 2014.
  5. Marcus Müller: "Directing the self-assembly of copolymer materials," Invited talk at MiFuN-workshop: Microstructural Functionality: Dynamics, Adaption, and Self-Healing at the Nanoscale, talk at University of Duisburg (Germany), April 2014.
  6. Marcus Müller and De-Wen Sun: "Process-directed assembly of block copolymer materials", invited talk at 8th International Symposium Molecular Order and Mobility in Polymer Systems, St. Petersburg (Russia), June 2014.
  7. Marcus Müller, De-Wen Sun, and Weihua Li: "Computational approaches for the dynamics of structure formation in self-assembling polymer materials," talk at 11th International Symposium on Polymer Physics, Nanjing (China), June 2014.
  8. Marcus Müller: “ Simulating morphology transitions in block copolymer materials” , invited talk at Workshop on Coarse-Grained Modeling of Polymers and Soft Materials for the Materials Genome Initiative, Gaitherburg (MA, USA), August 2014.
  9. Marcus Müller: “Studying the kinetics of copolymer self-assembly “, invited talk at Conference on Computational Physics CCP2014, Boston (MA, USA), August 2014.
  10. Marcus Müller:  “Studying the kinetics of copolymer assembly “, invited talk at  UCLan Westlakes (UK), September 2014.
  11. Marcus Müller: “Directed self-assembly of block-copolymer materials”, plenary talk at MAB5, LaPlata (Argentina), September 2014.
  12. Przemislaw Michalak, Tim Fühner and Andreas Erdmann, Weihua Li, Ulrich Welling, Juan Orozo: "Validation of reduced models for DSA by coarsed grained simulations", talk at 12th IISB Lithography Simulation Workshop, Hersbruck (Germany), September 2014.
  13. Weihua Li, Ulrich Welling, Juan Orozo, Przemislaw Michalak, Tim Fühner and Andreas Erdmann: "Defect removals of directed self-assembly (DSA) of block copolymers", talk at 12th IISB Lithography Simulation Workshop, Hersbruck (Germany), September 2014.
  14. Guillaume Fleury: “From Materials Design to Pattern Transfer Demonstration”, invited talk at E-MRS, Warsaw (Polans), September 2014.
  15. Marcus Müller: “Directing the self-assembly of copolymer materials”, talk at  TU Eindhoven (Netherlands), October 2014.
  16. Marcus Müller: “Morphology transitions in block copolymer materials: What can be learned from computer simulation?”, talk at PC-Kolloquium, University of Hamburg (Germany), November 2014.
  17. Marcus  Müller, Weihua Li and Ulrich Welling: "Defect Annihilation in Chemo-Epitaxial Directed Self-Assembly: Computer Simulation and Self-Consistent Field Theory", talk at 2014 MRS Fall Meeting, Boston (MA, USA), December 2015.
  18. Marcus Müller: “Morphology transitions in block copolymer materials: What can be learned from computer simulation?”, talk at Physik-Kolloquium, University of Münster (Germany), January 2015.
  19. Tim Fühner, Ulrich Welling, Przemislaw Michalak, Juan Orozco Rey, Weihua Li, Marcus Müller, Andreas Erdmann: „Computational approaches to DSA-assisted lithography applications”, talk at SPIE Advanced Lithography, San Jose (USA), February 2015.
  20. Raluca Tiron, Ahmed Gharbi, Patricia Pimenta-Barros, Sandra Bos, Antoine Fouquet, Jérôme Hazart, Xavier Chevalier, Céline Lapeyre, Sébastien Barnola, Sébastien Berard-Bergery, Loic Perraud,  Maxime Argoud, Gaëlle Chamiot-Maitral, Shayma Bouanani, Cédric Monget, Vincent Farys, Christophe Navarro, Célia Nicolet, Georges Hadziioannou, Guillaume Fleury: “Contact hole shrink and multiplication by directed self-assembly of block copolymers: from materials to integration”, talk at SPIE Advanced Lithography, San Jose (USA), February 2015.
  21. Laura Evangelio, Marta Fernández-Regúlez, Matteo Lorenzoni, Jordi Fraxedas and Francesc Pérez-Murano: "Density multiplication in directed self-assembly of block co-polymers by chemical surface modification using wide guiding stripes", poster at SPIE Advanced Lithography, San Jose (USA), February 2015.
  22. Matteo Lorenzoni, Laura Evangelio, Célia Nicolet, Christophe Navarro and Francesc Pérez-Murano: "Nanomechanical properties of solvent cast PS and PMMA polymer blends and block co-polymers", poster at SPIE Advanced Lithography, San Jose (USA), February 2015.
  23. Guillaume Fleury, K. Aissou, M. Mumtaz, X. Chevalier, C, Nicolet, C. Navarro, M. Fernandez-Regulez, P. Pimenta-Barros, R. Tiron, C. Brochon, E. Cloutet, and G. Hadziioannou: “Development and Integration of systems with enhanced resolutions based on Si-containing block copolymers for line space applications”, talk at SPIE Advanced Lithography, San Jose (USA), February 2015.
  24. Marcus Müller: “Defect motion and annihilation in block copolymer thin films”, talk at APS March meeting, San Antonio, TX, USA, March 2015.
  25. Tim Fühner, “Modeling and simulation of the DSA-assisted lithography process,” invited talk at China Semiconductor Technology International Conference Shanghai (China), March 2015.
  26. Raluca Tiron, Xavier Chevalier, Ahmed Gharbi, Maxime Argoud, Patricia Pimenta Barros, Christophe Navarro, Guillaume Fleury, Georges Hadziioannou: "Contact hole shrink by directed self-assembly of block copolymers: from material to integration", talk at EMRS Spring Meeting, Lille (France), May 2015. 
  27. Laura Evangelio, Matteo Lorenzoni, Marta Fernández-Regúlez, Xavier Borrisé, Jordi Fraxedas, Francesc Pérez-Murano: "Formation of chemical guiding patterns for DSA of block co-polymers by high resolution resistless nanolithography methods", talk at EMRS Spring Meeting, Lille (France), May 2015.
  28. Laura Evangelio, Matteo Lorenzoni, Jordi Fraxedas, Francesc Perez-Murano, Weihua Li, Marcus Müller: "Enabling density multiplication in directed self-assembly of block co-polymers by chemical surface modification using wide guiding stripes", talk at EMRS Spring Meeting, Lille (France), May 2015.
  29. Przemyslaw Michalak, Tim Fühner, Andreas Erdmann, Ulrich Welling, Juan Carlos Orozco Rey, Weihua Li, Marcus Müller: "Application of coarse-grained and reduced models of the directed self-assembly of block copolymers for nanolithography", talk at EMRS Spring Meeting, Lille (France), May 2015.
  30. Matteo Lorenzoni, Laura Evangelio, Célia Nicolet, Christophe Navarro, Francesc Pérez-Murano: "Nanomechanical properties of different phases in assembled block polymers thin films", poster at EMRS Spring Meeting, Lille (France), May 2015.
  31. Paul Coupillaud, Guillaume Fleury, Xavier Chevalier, Raluca Tiron, Celia Nicolet, Christophe Navarro, Georges Hadziioannou. “Post-Chemical Modification of PS-b-PMMA for Fine Tuning of Self-Assembly Behavior”, talk at EMRS Spring Meeting, Lille (France), May 2015.
  32. Marcus Müller: “Defect motion and annihilation in thin block copolymer films”, 19th symposium on thermophyscial properties, Boulder, CO (USA), June 2015
  33. Marcus Müller: “Studying slow collective processes by bridging between particle-based and continuum descriptions”, 12th International Conference for Mesoscopic Methods in Engineering and Science, CSRC, Beijing (China), July 2015
  34. Marcus Müller: “Process-directed self-assembly of block copolymer materials”, Kavli Institute for Theoretical Physics, Beijing (China), August 2015.
  35. Laura Evangelio, Matteo Lorenzoni, Jordi Fraxedas, Francesc Pérez-Murano: "Determination of the interfacial energies in chemical guiding patterns for directed self-assembly of block co-polymers", International Conference on Micro and Nano Engineering 2015, The Hague (Netherlands), September 2015.
  36. Matteo Lorenzoni, Laura Evangelio, Célia Nicolet, Christophe Navarro, Francesc Pérez-Murano: "Assessing the local nanomechanical properties of self-assembled block copolymers thin films by Peak Force tapping", European Conference on Surface Science (ECOSS31), Barcelona (Spain), September 2015.
  37. Laura Evangelio, Matteo Lorenzoni, Federico Gramazio, Francisco Espinosa, Ricardo García, Francesc Pérez-Murano, Jordi Fraxedas: "Characterization of buried interfaces of grafted polymer films using high kinetic energy photoemission", European Conference on Surface Science (ECOSS31), Barcelona (Spain), September 2015.
  38. Ullrich Welling, Weihua Li, Juan C. Orozco, Przemislaw Michalak, Tim Fühner, Andreas Erdmann, Marcus Müller: "Reduced models for DSA simulations", Talk at 13. International Fraunhofer Lithography Simulation Workshop, Behringersmühle (Germany), September 2015.
  39. Tim Fühner, Przemislaw Michalak, Ullrich Welling, Weihua Li, Juan C. Orozco, Marcus Müller, Andreas Erdmann: "Toward an integrated lithography/DSA modeling platform", Talk at 13. International Fraunhofer Lithography Simulation Workshop, Behringersmühle (Germany), September 2015.
  40. Marcus Müller: “Process-directed self-assembly of copolymer materials”, Lorentz center, Leiden (Netherlands), September 2015.
  41. Marcus Müller: “Defect motion and annihilation in block copolymer thin films”, 100th Annual meeting of the Argentine Physical Society, Merlo (Argentina), September 2015.
  42. Laura Evangelio, Matteo Lorenzoni, Marta Fernandez-Regulez, Xavier Borrisé, Jordi Fraxedas, Francesc Pérez-Murano: "Creation of chemical guiding patterns for DSA of block copolymers by high resolution resistless nanolithography methods", 1st DSA Symposium, Leuven (Belgium), October 2015.
  43. Laura Evangelio, Matteo Lorenzoni, Jordi Fraxedas, Francesc Pérez-Murano, Weihua Liu, Marcus Müller: "Enabling density multiplication in directed self-assembly of block copolymers by chemical surface modification using wide guiding stripes", 1st DSA Symposium, Leuven (Belgium), October 2015.
  44. Przemysław Michalak, Ulrich Welling, Juan Carlos Orozco Rey, Tim Fühner, Marcus Müller, Andreas Erdmann: "Comparison of coarse-grained and reduced models of directed self-assembly of block copolymers for the application for contact shrink process", 1st DSA Symposium, Leuven (Belgium), October 2015.
  45. Weihua Li, Marcus Müller, “Defects during directed self-assembly (DSA) of block copolymers”, poster at 1st DSA Symposium, Leuven (Belgium), October 2015.
  46. Andreas Erdmann, Przemysław Michalak, Mohamed Ismail, Tim Fühner, Maxime Argoud, Raluca Tiron, Ahmed Gharbi, Ulrich Welling, Marcus Müller: "Process window analysis for contact hole shrinking: A simulation study", Talk at 1st DSA Symposium, Leuven (Belgium), October 2015.
  47. Marcus Müller: “Process-directed self-assembly of copolymers”, Karman conference, Vaalsbroeck Castle (Netherlands), October 2015.
  48. P.-N. Tzounis, S. D. Anogiannakis and D. N. Theodorou: "Atomistic Simulations of Polymer Melts and Blends used in Directed Self-Assembly Lithography", Talk at SGSE web meeting, October 2015, Web-Meeting.
  49. Marcus Müller:  „Structure formation in block copolymers: The role of metastable states“, DFG Rundgespräch: Selbstorganisation in Nichtgleichgewichtsprozessen, Geesthacht (Germany), November 2015.
  50. Marcus Müller: „Process-directed self-assembly of copolymers“, Tu/e Multiscale Symposium, Eindhoven, Netherlands, December 2015.
  51. Marcus Müller: „Minimal, soft, coarse-grained models for polymer blends and copolymers: Sucesses and challenges“, invited talk at Pacifichem 2015, Honolulu, HI, USA, December 2015.
  52. Tim Fühner, Przemysław Michalak, Ulrich Welling, Juan Carlos Orozco-Rey, Marcus Müller, and Andreas Erdmann: “An integrated source/mask/DSA optimization approach”, talk at SPIE Advanced Lithography, San Jose (USA), February 2016.
  53. Guillaume Claveau, Patrick Quéméré, Maxime Argoud,  Jérôme Hazart, Patricia Pimenta Barros, Aurélien Sarrazin, Nicolas. Possémé, Raluca Tiron, Xavier Chevalier, Célia Nicolet, Christophe Navarro: “Surface affinity role in graphoepitaxy of lamellar block copolymers”, talk at SPIE Advanced Lithography, San Jose (USA), February 2016.
  54. Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Gaelle Chamiot Maitral, Isabelle Servin, Sandra Bos, Patricia Pimenta-Barros, Aurelien Sarrazin, Antoine Fouquet, Jerome Hazart, ,  Xavier Chevalier, Christophe Navarro, Celia Nicolet, Arkema,  Celine Lapeyre, Shaima Bouanani, Cedrid Monget:” Process highlights to enhance DSA contact patterning performances”, talk and proceedings at SPIE 2016, 22-25 February 2016, San Jose, USA.
  55. P.-N. Tzounis, S. D. Anogiannakis and D. N. Theodorou: "Atomistic Simulations of Oligomers used in Directed Self-Assembly Lithography: Estimation of the Interaction Parameter χ", Talk at SGSE web meeting, March 2016, Web-Meeting.
  56. Marcus Müller: “Process-directed self-assembly of copolymers”, APS March Meeting, Baltimore, MD, USA, March 2016.
  57. Laura Evangelio, Weihua Li, Matteo Lorenzoni, Jordi Fraxedas, Marcus Müller, Francesc Perez-Murano: „Role of interface energies in the directed self-assembly of block copolymers in wide chemical patterns”, talk at EUPOC 2016, Lago di Garda, May 2016.
  58. Przemysław Michalak, Maxime Argoud, Mohamed Ismail, Raluca Tiron, Ulrich Welling, Juan Carlos Orozco Rey, Marcus Müller, Tim Fühner, Andreas Erdmann: “Parameter study of the Ohta-Kawasaki model in PS-b-PMMA thin films”, talk at EUPOC 2016, Lago di Garda, May 2016.
  59. Karim Aissou, Muhammad Mumtaz, Ségolène Antoine, Wonsang Kwon, Yecheol Rho, Guillaume Fleury, Georges Hadziioannou. ”Highly-Ordered Cylindrical, Lamellar and Gyroid Domains Produced from Si-Containing Block Copolymer Thin Films”, talk at EUPOC 2016, Lago di Garda, May 2016.
  60. Ségolène Antoine, Karim Aissou, Muhammad Mumtaz, Wonsang Kwon, Guillaume Fleury, Georges Hadziioannou. “[6.6.6], [4.8.8] tiling patterns and hierarchical morphology formed by 3µ-ABCs synthetized via a mid-functional methodology”, talk at EUPOC 2016, Lago di Garda, May 2016.
  61. Maxime Argoud, Ahmed Gharbi, Guillaume Claveau, F. Delachat, P. Pimenta-Barros, G. Chamiot Maitral, S. Bouanani, C. Lapeyre, R. Tiron, C. Nicolet, X. Chevalier, Chrisophe Navarro, Andreas Erdmann, Przemysław Michalak, Tim Fühner: “Graphoepitaxy DSA Process Versatility: Template Affinity Role”, invited talk at SPSD conference, Tokyo, June 2016.
  62. Tim Fühner, Przemysław Michalak, Maxime Argoud, Antoine Fouquet, Jérôme Hazart, Raluca Tiron, Andreas Erdmann: “A direct source/mask/DSA optimization approach” , invited talk at SPSD conference, Tokyo, June 2016.
  63. Marcus Müller: “Process-directed self-assembly of copolymer materials”, invited talk at 12th International Symposium on Polymer Physics, Guiyang, China, June 2016.
  64. P.-N. Tzounis, S. D. Anogiannakis and D. N. Theodorou: "Atomistic Simulations of Oligomers used in Directed Self-Assembly Lithography", Talk at SGSE web meeting, July 2016, Web-Meeting.
  65. 40.   Marcus Müller: “Process-directed self-assembly of copolymer materials”, talk, 80th Prague meeting on polymers (“Self-assembly in the world of polymers”), Prague, Czech Republic, July 2016.
  66. Marcus Müller: “Process-directed self-assembly of copolymer materials”, talk, StatPhys 2016, Lyon, France, July 2016.
  67. Marcus Müller: “Process-directed self-assembly of copolymer materials”, talk, ACS fall meeting, Philadelphia, USA, August 2016.
  68. Tim Fühner: “Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach”, Talk at 14. International Fraunhofer Lithography Simulation Workshop, Hersbruck (Germany), September 2016.
  69. Guillaume Claveau, Maxime Argoud, Patrick Quéméré, Kevin Lepinay, Nicolas Possémé, Raluca Tiron: “The 300mm evaluation of a lamellar PS-b-PMMA for L/S applications with graphoepitaxy”, talk at EMRS Fall Meeting, Warsaw (Poland), September 2016
  70. Marcus Müller: “Defect motion and annihilation in DSA of lamella-forming copolymers”, invited talk at 2nd DSA Symposium, Grenoble (France), October 2016.
  71. Andreas Erdmann, Przemysław Michalak, Mohamed Ismail, Tim Fühner, Maxime Argoud, Guillaume Claveau, Raluca Tiron, Marcus Müller, Ian Cayrefourcq: “Modeling study of 3D morphologies for a line multiplication process”, talk at 2nd DSA Symposium, Grenoble (France), October 2016.
  72. Laura Evangelio, Marta Fernández-Regúlez, Patricia Pimenta-Barros, Maxime Argoud, Xavier Chevalier, Celia Nicolet, Ian Cayrefourcq, Christophe Navarro, Raluca Tiron, Marcus Muller, Francesc Perez-Murano: “Control of interface energies for implementing directed self-assembly of block copolymers in a 300 mm CMOS processing line”, talk at 2nd DSA Symposium, Grenoble (France), October 2016.
  73. Panagiotis-Nikolaos Tzounis, Stefanos D. Anogiannakis, Doros N. Theodorou: “Atomistic Simulations of Oligomers used in Directed Self-Assembly Lithography: Estimation of the Interaction Parameter χ”, poster at 2nd DSA Symposium, Grenoble (France), October 2016.
  74. Panagiotis-Nikolaos Tzounis, Stefanos D. Anogiannakis, Doros N. Theodorou: “Single Unperturbed Chain Monte Carlo Algorithm: A General Methodology for Estimating the Dimensions of Polymer Chains”, poster at 2nd DSA Symposium, Grenoble (France), October 2016.
  75. Guillaume Claveau, Maxime Argoud, Patricia Pimenta Barros, Nicolas Possémé, Raluca Tiron, Xavier Chevalier, Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, “The 300mm evaluation of a 38nm period lamellar PS-b-PMMA for L/S applications with graphoepitaxy”, talk at 2nd DSA Symposium, Grenoble (France), October 2016.
  76. Ahmed Gharbi, Florian Delachat, Patricia Piment Barros, Maxime Argoud, Gaëlle Chamiot-Maitral, Shayma Bouanani, Sandra Bos, Céline Lapeyre, Cédric Monget, Xavier Chevalier, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Laurent Pain, Raluca Tiron: “Defectivity monitoring for DSA contact hole application”, talk at 2nd DSA Symposium, Grenoble (France), October 2016.

Publications on Partners' Background Work

V. Agudelo, P. Evanschitzky, A. Erdmann, and T. Fühner, “Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography”, Proc. SPIE 8326 (2012) 832609.

V. Agudelo, T. Fühner, A. Erdmann, and P. Evanschitzky: „Application of artificial neural networks to compact mask models in optical lithography simulation”, Proc. SPIE 8683 (2013) 868317.

T. Chevolleau, G. Cunge, M. Delalande, X. Chevalier, R. Tiron, S. David, M. Darnon, C. Navarro: “Self-assembly patterning using block copolymer for advanced CMOS technology: optimisation of plasma etching process”, Proc. SPIE 8328 (2012) 83280M

K. Ch. Daoulas, D. N. Theodorou, A. Roos, C. Creton: “Self consistent field calculations of morphology in block copolymer systems”, Macromolecules 37, (2004), 5093-5109.

A. Erdmann, T. Fühner, F. Shao, and P. Evanschitzky: “Lithography simulation: modeling techniques and selected applications”, Proc. SPIE 7390 (2009) 739002.

A. Erdmann, T. Fühner, and P. Evanschitzky: “Mask diffraction analysis and optimization for EUV masks“,J. Micro/Nanolith. MEMS MOEMS 9 (2010) 013005 and Proc. SPIE 7271 (2009) 72711E.

A. Erdmann, F. Shao, J. Fuhrmann, A. Fiebach, G.P. Patsis, and P. Trefonas: “Modeling of double patterning interactions in litho-curing-litho-etch (LCLE) processes”, Proc. SPIE 76740 (2010) 76400B.

A. Erdmann, F. Shao, V. Agudelo, T. Fühner, and P. Evanschitzky: "Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography”, Journal of Modern Optics 58 (2010) 480, invited article.

A. Erdmann, F. Shao, P. Evanschitzky, and T. Fühner: „Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography“, Journal of Vacuum Science and Technology B 28 (2010) C6J1.

A. Erdmann, P. Evanschitzky, F. Shao, T. Fühner, G. Lorusso, E. Hendrickx, A.M. Goethals, R. Jonckheere, T. Bret, T. Hofmann: “Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects”, Proc. SPIE 8171 (2011) 81710M.

A. Erdmann, P. Evanschitzky, T. Bret, and R. Jonckheere: “Modeling strategies for EUV mask multilayer defect dispositioning and repair”, Proc. SPIE 8679 (2013) 86790Y.

P. Evanschitzky, F. Shao, A. Erdmann: „Efficient simulation of EUV multilayer defects with rigorous data base approach”, J. Micro/Nanolith. MEMS MOEMS. 12 (2013) 021005.

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann: "Dr.LiTHO – a development and research lithography simulator“, Proc. SPIE 6520 (2007) 65203F-1.

T. Fühner, A. Erdmann, and S. Seifert: „A direct optimization approach for lithographic process conditions“, Journal of Micro/Nanolithography, MEMS, and MOEMS, 6 (2007) 031006.

T. Fühner, I. Kodrasi, C. Kampen, T. Schnattinger, A. Burenkov, and A. Erdmann: “A simulation study on the impact of lithographic process variations on CMOS device performance”, Proc. SPIE 6924 (2008) 692453.

T. Fühner, P. Evanschitzky, and Andreas Erdmann: “Mutual source, mask and projector pupil optimization” Proc. SPIE 8322 (2012) 83220I.

S.X. Ji, U. Nagpal, G. Liu, S.P. Delcambre, M. Müller, J.J. de Pablo, and P.F. Nealey: "Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates", ACS Nano 6 (2012) 5440.

N. Ch. Karayiannis, V. G. Mavrantzas, D. N. Theodorou: “Connectivity-altering Monte Carlo algorithms for the rapid equilibration of long-chain polymer melts at all length scales”, Phys. Rev. Lett. 88, (2002), 105503.

T. Kozawa and A. Erdmann: „Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography”, Applied Physics Express 4 (2011) 026501.

K. F. Mansfield, D. N. Theodorou: “Structure, conformation, and adhesion at polymer-solid interfaces”, Macromolecules 24, (1991), 4295-4309.

M. Müller and D.W. Sun: "Directing the self-assembly of block copolymers into a metastable complex network phase via a deep and rapid quench", Phys. Rev. Lett. 111 (2013)  267801.

M. Müller and J.J. de Pablo: "Computational approaches for the dynamics of structure formation in self-assembling polymeric materials", Annual Reviews of Materials Research 43 (2013) 1-34.

M. Müller: "Geometry-controlled interface localization-delocalization transition in block copolymers", Phys. Rev. Lett. 109 (2012)  087801.

U. Nagpal, M Müller, P.F. Nealey, and J.J. de Pablo, "Free energy of defects in ordered assemblies of block copolymer domains", ACS Macro Letters 1  (2012) 418.

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