Pubications from the project will be listed here once they have been published. You are kindly invited to revisit this page to check for updates.
Below you will find also selected publications describing background work by the project partners.
Pubications from the project will be listed here once they have been published. You are kindly invited to revisit this page to check for updates.
Below you will find also selected publications describing background work by the project partners.
V. Agudelo, P. Evanschitzky, A. Erdmann, and T. Fühner, “Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography”, Proc. SPIE 8326 (2012) 832609.
V. Agudelo, T. Fühner, A. Erdmann, and P. Evanschitzky: „Application of artificial neural networks to compact mask models in optical lithography simulation”, Proc. SPIE 8683 (2013) 868317.
T. Chevolleau, G. Cunge, M. Delalande, X. Chevalier, R. Tiron, S. David, M. Darnon, C. Navarro: “Self-assembly patterning using block copolymer for advanced CMOS technology: optimisation of plasma etching process”, Proc. SPIE 8328 (2012) 83280M
K. Ch. Daoulas, D. N. Theodorou, A. Roos, C. Creton: “Self consistent field calculations of morphology in block copolymer systems”, Macromolecules 37, (2004), 5093-5109.
A. Erdmann, T. Fühner, F. Shao, and P. Evanschitzky: “Lithography simulation: modeling techniques and selected applications”, Proc. SPIE 7390 (2009) 739002.
A. Erdmann, T. Fühner, and P. Evanschitzky: “Mask diffraction analysis and optimization for EUV masks“,J. Micro/Nanolith. MEMS MOEMS 9 (2010) 013005 and Proc. SPIE 7271 (2009) 72711E.
A. Erdmann, F. Shao, J. Fuhrmann, A. Fiebach, G.P. Patsis, and P. Trefonas: “Modeling of double patterning interactions in litho-curing-litho-etch (LCLE) processes”, Proc. SPIE 76740 (2010) 76400B.
A. Erdmann, F. Shao, V. Agudelo, T. Fühner, and P. Evanschitzky: "Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography”, Journal of Modern Optics 58 (2010) 480, invited article.
A. Erdmann, F. Shao, P. Evanschitzky, and T. Fühner: „Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography“, Journal of Vacuum Science and Technology B 28 (2010) C6J1.
A. Erdmann, P. Evanschitzky, F. Shao, T. Fühner, G. Lorusso, E. Hendrickx, A.M. Goethals, R. Jonckheere, T. Bret, T. Hofmann: “Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects”, Proc. SPIE 8171 (2011) 81710M.
A. Erdmann, P. Evanschitzky, T. Bret, and R. Jonckheere: “Modeling strategies for EUV mask multilayer defect dispositioning and repair”, Proc. SPIE 8679 (2013) 86790Y.
P. Evanschitzky, F. Shao, A. Erdmann: „Efficient simulation of EUV multilayer defects with rigorous data base approach”, J. Micro/Nanolith. MEMS MOEMS. 12 (2013) 021005.
T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann: "Dr.LiTHO – a development and research lithography simulator“, Proc. SPIE 6520 (2007) 65203F-1.
T. Fühner, A. Erdmann, and S. Seifert: „A direct optimization approach for lithographic process conditions“, Journal of Micro/Nanolithography, MEMS, and MOEMS, 6 (2007) 031006.
T. Fühner, I. Kodrasi, C. Kampen, T. Schnattinger, A. Burenkov, and A. Erdmann: “A simulation study on the impact of lithographic process variations on CMOS device performance”, Proc. SPIE 6924 (2008) 692453.
T. Fühner, P. Evanschitzky, and Andreas Erdmann: “Mutual source, mask and projector pupil optimization” Proc. SPIE 8322 (2012) 83220I.
S.X. Ji, U. Nagpal, G. Liu, S.P. Delcambre, M. Müller, J.J. de Pablo, and P.F. Nealey: "Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates", ACS Nano 6 (2012) 5440.
N. Ch. Karayiannis, V. G. Mavrantzas, D. N. Theodorou: “Connectivity-altering Monte Carlo algorithms for the rapid equilibration of long-chain polymer melts at all length scales”, Phys. Rev. Lett. 88, (2002), 105503.
T. Kozawa and A. Erdmann: „Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography”, Applied Physics Express 4 (2011) 026501.
K. F. Mansfield, D. N. Theodorou: “Structure, conformation, and adhesion at polymer-solid interfaces”, Macromolecules 24, (1991), 4295-4309.
M. Müller and D.W. Sun: "Directing the self-assembly of block copolymers into a metastable complex network phase via a deep and rapid quench", Phys. Rev. Lett. 111 (2013) 267801.
M. Müller and J.J. de Pablo: "Computational approaches for the dynamics of structure formation in self-assembling polymeric materials", Annual Reviews of Materials Research 43 (2013) 1-34.
M. Müller: "Geometry-controlled interface localization-delocalization transition in block copolymers", Phys. Rev. Lett. 109 (2012) 087801.
U. Nagpal, M Müller, P.F. Nealey, and J.J. de Pablo, "Free energy of defects in ordered assemblies of block copolymer domains", ACS Macro Letters 1 (2012) 418.
L. Oria, A. Ruiz de Luzuriaga, X. Chevalier, J.A. Alducín, D. Mecerreyes, R. Tiron, S. Gaugiran, F. Perez-Murano: “Guided self-assembly of block-copolymer for CMOS technology: a comparative study between grapho-epitaxy and surface chemical modification”, Proc. SPIE 7970 (2011) 79700P-1.
L. Oria, A. Ruiz de Luzuriaga, J.A. Alducín, F. Perez-Murano: “Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer”, Proc. SPIE 8323 (2012) 832327-1
L. Oria, A. Ruiz de Luzuriaga, J.A. Alducín, F. Perez-Murano: “Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithography”, Proc. SPIE 8680 (2013) 868022-1
L. Oria, A. Ruiz de Luzuriaga, J.A. Alducín, F. Perez-Murano: “Polystyrene as a brush layer for directed self-assembly of block co-polymers”, Microelectronic Engineering, in Press (2013)
T. Spyriouni, I. G. Economou, D. N. Theodorou: “Prediction of phase equilibria in mixtures of chain molecules”, Phys. Rev. Lett. 80, (1998), 4466-4469.
T. Spyriouni, C. Tzoumanekas, D. N. Theodorou, F. Müller-Plathe, G. Milano: “Coarse-graining and reverse mapping of molecular representation for polymers”, Macromolecules 40, (2007), 3876-3885.
S. Tallegas, T. Baron, G. Gay, C. Aggrafeil, B. Salhi, T. Chevolleau, G. Cunge, A. Bsiesy, R. Tiron, X. Chevalier, C. Navarro, K. Aissou, I. Otsuka, S. Halila, S. Fort, R. Borsali: “Block copolymer technology applied to nanoelectronics”, Phys. Status Solidi C 10 (2013) 1195-1206, invited article.
D. N. Theodorou: “Infrequent event-based approaches for the computation of small molecule diffusivity and structural relaxation in glassy polymers”, in Hierarchical Methods for Dynamics in Complex Molecular Systems; J. Grotendorst, G. Sutmann, G. Gompper, D. Marx, Eds.; Schriften des Forschungzentrums Jülich, IAS Series Volume 10: Jülich, (2012), pp 347-389.
R. Tiron, C. Couderc, J. Pradelles, J. Bustos, L. Pain, C. Navarro, S. Magnet, G. Fleury, G. Hadziioannou: “Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study”, Jornal of Vacuum Science and Technology B 29 (2011) 06F206.
R. Tiron, X. Chevalier, S. Gaugiran, J. Pradelles, H. Fontaine, C. Couderc, L. Pain, C. Navarro, T. Chevolleau, G. Cunge, M. Delalande, G. Fleury, G. Hadziioannou: “Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements”, Proc. SPIE 8323 (2012) 83230O
R. Tiron, A. Gharbi, M. Argoud, X. Chevalier, J. Belledent, P. Pimenta Barros, I. Servin, C. Navarro, G. Cunge, S. Barnola, L. Pain, M. Asai, C. Pieczulewski: “The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication”, Proc. SPIE 8680 (2013) 868012.
C. Tzoumanekas, D. N. Theodorou: “Topological analysis of linear polymer melts: A statistical approach”, Macromolecules 39, (2006), 4592-4603.