FP7 ICT Project CoLiSA.MMP

Computational Lithography for Directed Self-Assembly: Materials, Models and Processes

CoLiSA.MMP combines European expertise in soft matter physics, block copolymer chemistry, lithographic process and computational lithography. This will help to bridge the gap between the multifaceted research activities on DSA and the integration of DSA in future processes and design flows for More Moore IC manufacturing and for new functionality in More than Moore